Mono-Si Alkaline Polishing Equipment
Product Name: Mono-Si Alkaline Polishing Equipment
Function: Polishing treatment applied to the surface of silicon wafers
Process Flow: Pre-cleaning→Polishing→Post-cleaning→Pickling→Pre-dehydration→Drying
Features: Supports MES, RFID, and optional online weighing functions; one-key online washing and solution replacement for simple and quick fluid exchange; process circulation volume adjustable according to process requirements; compatible with additives from various brands, achieving excellent polishing results.
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Product Name |
Mono-Si Alkaline Polishing Equipment |
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Model |
KSSDE |
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Route Application |
TOPCON, HJT, XBC, etc. |
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Function |
Polishing treatment applied to the surface of silicon wafers |
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Process Flow |
Pre-cleaning→Polishing→Post-cleaning→Pickling→Pre-dehydration→Drying |
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Compatible Wafer |
182x182mm, compatible with various sizes of 18X-230 silicon wafers |
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Cassette Number |
4,6 cassettes |
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Capacity |
182: ≥16000 pcs/hour; 210: ≥12500 pcs/hour |
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Breakage Rate |
Breakage rate <0.01% (Silicon wafer thickness ≥130um) |
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PowerConsumption/ Voltage |
310KW/380V 50Hz 3-phase 5-wire system |
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Features |
Supports MES, RFID, and optional online weighing functions; one-key online washing and solution replacement for simple and quick fluid exchange; process circulation volume adjustable according to process requirements; compatible with additives from various brands, achieving excellent polishing results. |