Mono-Si Texturing Cleaning Equipment
Product Name: Mono-Si Texturing Cleaning Equipment
Function: Utilizing the anisotropic reaction of silicon in alkali to prepare a uniform pyramid velvet structure on the surface of silicon wafers, enhancing the light trapping effect of silicon wafers
Process Flow: Rough Polishing→ Pre-cleaning→Texturing→Post Cleaning (compatible with O3 cleaning)→Pickling→Pre-dehydration→Drying
Features: The prepared pyramid structure is uniform, and the etching depth is adjustable; supports MES, RFID, and optional online weighing functions; one-key cleaning and slot replacement online for simple and quick solution exchange; the circulation volume of the process tank can be adjusted according to process requirements.
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Product Name |
Mono-Si Texturing Cleaning Equipment |
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Model |
KSTEX |
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Route Application |
TOPCON, PERC, HIT, XBC, Stacked Batteries, etc. |
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Function |
Utilizing the anisotropic reaction of silicon in alkali to prepare a uniform pyramid velvet structure on the surface of silicon wafers, enhancing the light trapping effect of silicon wafers. |
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Process Flow |
Rough Polishing→ Pre-cleaning→Texturing→Post Cleaning (compatible with O3 cleaning)→Pickling→Pre-dehydration→Drying |
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Compatible Wafer |
182x182mm, compatible with various sizes of 18X-230 silicon wafers |
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Cassette Number |
4, 6 cassettes |
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Capacity |
182: ≥16000 pcs/hour; 210: ≥12500 pcs/hour |
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Breakage Rate |
Breakage Rate <0.01% (Silicon wafer thickness ≥130um) |
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Power Consumption/ Voltage |
310KW/ 380V50Hz, 3-phase 5-wire |
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Features |
The prepared pyramid structure is uniform, and the etching depth is adjustable; supports MES, RFID, and optional online weighing functions; one-key cleaning and slot replacement online for simple and quick solution exchange; the circulation volume of the process tank can be adjusted according to process requirements. |